Several emerging fields of applied science and technology can benefit from the ability to perform two- and three-dimensional nanopatterning at low cost over large areas with simple experimental setups. This dissertation describes the study of a new, simple two-dimensional patterning technique for producing structures with nanometer feature sizes designated by Near Field Phase Shift Lithography. The approach uses unusual classes of elastomeric optical phase masks and conventional photoresist materials and takes advantage of near field and proximity optical effects. In order to understand how the complex optics that determine the operation of this technique work and to improve the design of the system, I performed finite element optical simulations to determine the distributions of intensity of the light in the near field by passage through a phase mask. I compared these results to experimental measurements using a scanning optical microscope and to the actual patterns of photoresist generated using this technique. Exploiting subtle optical effects revealed by theory and experiment expanded the range of patterning capabilities.

A second dissertation topic involved exploring the field of nano-plasmonics, with a strong emphasis on sensing applications. Until recently, the development of this field has suffered from difficulties and high cost associated to the production of high quality samples. Soft lithographic techniques, including phase shift lithography and replica molding, have the potential to solve this long-standing problem if applied to the fabrication of novel plasmonic crystals. I used Finite-Difference Time-Domain (FDTD) calculations to model their optical response and to assess the sensing potential of the different configurations. Enhancements in sensitivity by a factor of 10 are predicted.