Fabrication and characterization of the electrical and optical properties of n-type thin film transparent conducting oxides deposited by neutralized ion beam sputtering and pulsed laser deposition
by Vanderford, John D., M.S., NORTHERN ILLINOIS UNIVERSITY, 2011, 298 pages; 1499491

Abstract:

Transparent conducting oxides have become a fundamental electronic material for numerous current technologies and are optimally deposited as a uniform thin film with low electrical resistivity and high optical transmission. The purpose of this study is to characterize the electrical and optical characteristics of three TCO: Indium Tin Oxide (ITO) (95%, 5%), Zinc Oxide (ZnO), and Aluminum doped Zinc Oxide (AZO) (98%, 2%). The deposition techniques of neutralized ion beam sputtering and pulsed laser deposition will be investigated. ITO will be deposited from commercially available sintered targets whereas ZnO and AZO will be deposited from powder pressed targets. The results have shown that AZO deposit AZO from a powder pressed target with comparable electrical and optical properties to that of ITO deposited from a sintered target.
 
AdviserAlan P. Genis
SchoolNORTHERN ILLINOIS UNIVERSITY
SourceMAI/ 50-02, p. , Oct 2011
Source TypeThesis
SubjectsElectrical engineering; Materials Science
Publication Number1499491
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